Chih-Hung Sun,
1 Brian J. Ho,1 Bin Jiang,2 and Peng Jiang1,*
OPTICS LETTERS / Vol. 33, No. 19 / October 1, 2008 p 2224-2226
Purpose of Study-
The authors developed a simple effective method in order to make a patterned surface that decreases the reflectivity of a surface. In this manuscript they apply this method to GaAs wafers.
Methods-
Silica colloidal spheres are dispersed on a wafer using a simple spin-coating technique. The size of the colloids can be controlled by varing the speed of the spin-coater. In order to apply this method to GaAs surfaces, a single-layer reduction technique was employed. Once the silica has been deposited, a PDMS stamp is created. Using the stamp as a mold, they are able create a template to form a patterned polymer film.
Key Findings-
- Subwavelength antireflective gratings can be easily formed on a variety of substrates.
- Silica colloids can be uniformily dispersed across a substrate, and be used to create a pattern template.
Posted by chrisfaulkner